离子注镧对镍表面氧化膜生长机制及应力水平的影响

靳惠明; FELIX Adriana; AROYAVE Majorri

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离子注镧对镍表面氧化膜生长机制及应力水平的影响

材料科学与工程 | 更新时间：2023-11-28

- 离子注镧对镍表面氧化膜生长机制及应力水平的影响
- Influence of La Ion-implantation on Growing Mechanism and Stress Status of Oxide Film Formed on Nickel
- 工程科学与技术 2009年41卷第6期页码：114-118
- 作者机构：
  
  1. 扬州大学扬子津校区机械工程学院材料教科部
  2. 国立安第克大学材料科学与工程学院哥伦比亚麦德林,23715
- 作者简介：
- 基金信息：
  
  国家自然科学基金资助项目(59231011);哥伦比亚国家自然科学基金资助项目(M018327)
- DOI：
  中图分类号：
- 纸质出版日期：2009，
  
  网络出版日期：2009-4-4，
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靳惠明,FELIX Adriana,AROYAVE Majorri.离子注镧对镍表面氧化膜生长机制及应力水平的影响[J].工程科学与技术,2009,41(6):114-118.

Jin Hui-Ming, FELIX Adriana, AROYAVE Majorri. Influence of La Ion-implantation on Growing Mechanism and Stress Status of Oxide Film Formed on Nickel[J]. Advanced Engineering Sciences, 2009,41(6):114-118.
靳惠明,FELIX Adriana,AROYAVE Majorri.离子注镧对镍表面氧化膜生长机制及应力水平的影响[J].工程科学与技术,2009,41(6):114-118. DOI：

Jin Hui-Ming, FELIX Adriana, AROYAVE Majorri. Influence of La Ion-implantation on Growing Mechanism and Stress Status of Oxide Film Formed on Nickel[J]. Advanced Engineering Sciences, 2009,41(6):114-118. DOI：

摘要

中文摘要: 对纯镍及其表面离子注镧样品在900 ℃空气中的恒温氧化规律进行了研究。采用扫描电子显微镜(SEM)和透射电子显微镜(TEM)对NiO膜的微观形貌和结构进行测试。采用激光拉曼(Raman)谱和X射线衍射仪(XRD)对两种样品表面氧化膜的应力状态进行测量。采用二次离子质谱(SIMS)对氧化膜内元素Ni、O和La 的深度分布情况进行了测量。结果表明，离子注镧显著降低了镍的恒温氧化速率，细化了表面NiO膜的晶粒尺寸，同时，将氧化膜生长的生长机制由未注镧前Ni2+阳离子向外扩散转变为注镧后O2-阴离子向内扩散为主。X射线衍射和激光拉曼测量均反映出注镧引起的膜内应力降低效应，并且，结合氧化膜内应力深度分布的不均匀性及膜生长过程中存在的稀土元素效应对两种应力测量结果之间存在的偏差进行了细致分析。

Abstract

Abstract:Isothermal oxidation behavior of pure nickel and its lanthanum ion-implanted sample were studied at 900 ℃ in air. The surface morphology and microstructure of NiO films formed on both samples were examined by scanning electronic microscopy(SEM) and transmission electronic microscopy(TEM). Laser Raman spectrometer and X-ray diffraction spectrometer(XRD) were used to study the stress status in NiO films formed on La-free and La-implanted nickel. Secondary ion massive spectrum(SIMS) was used to examine Ni

O and La element depth distribution in oxide films. Results showed that La implantation remarkably reduced the growing speed and grain size of NiO film. Meanwhile it changed the oxide film growing mechanism from predominant Ni2+ cation outward diffusion to O2- anion inward diffusion. XRD and Raman testing results showed the stress declination effect due to La-implantation

while the discrepancy between the two testing results was fully analyzed regarding to the heterogeneous stress distribution in oxide film and the rare earth effect during the film growing process.

关键词

离子注入二次离子质谱拉曼镧氧化镍

Keywords

ion-implantationSIMSRamanlanthanumnickel oxide

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